Formation Mechanism of Precursor Films at High Temperatures: A Review

doi:10.1186/s10033-022-00686-4

	Formation Mechanism of Precursor Films at High Temperatures: A Review
	Lin, Qiaoli; Liu, Lu; Zhu, Wenqi
	2022-12
发表期刊	Chinese Journal of Mechanical Engineering (English Edition)
ISSN	1000-9345
卷号	35 期号:1
摘要	The formation of a precursor film (PF) is always coupled with better wettability; thus, clarifying the formation mechanism is required to optimize the interfacial structures. However, recent research focuses on inert wetting systems at room temperature, which cannot guide practical material processing at high temperatures. In this review, PF formation mechanisms at high temperatures were reviewed. The mechanisms are surface diffusion, evaporation–condensation, subcutaneous infiltration, and rapid absorption and film overflow. In experimental metal/metal systems, the most probable mechanism is subcutaneous infiltration, related to the apparent contact angle, radius, and height of the gap between the substrate metal and the oxide film. The rapid absorption and film overflow mechanism usually occurs in metal/ceramic systems. The PF appearance for the adsorption mechanism must satisfy the paradox, that is, the relative inertial and high-affinity liquid/solid interface. Finally, another possible mechanism of PF appearance for the reactive wetting system at high temperatures was proposed, that is, the thin-surface transport mechanism. The PF formation is sensitive to external conditions. Therefore, it is necessary to develop thermodynamic and dynamic models for predicting and simulating PFs. © 2022, The Author(s).
关键词	Contact angle Oxide films Temperature Diffusing band Film formations Formation mechanism Halo Highest temperature Interfacial structures Precursor films Recent researches Research focus Wetting foot
DOI	10.1186/s10033-022-00686-4
收录类别	EI ; SCIE
语种	英语
WOS研究方向	Engineering
WOS类目	Engineering, Mechanical
WOS记录号	WOS:000764995900002
出版者	Springer
EI入藏号	20221111788872
EI主题词	Wetting
EI分类号	641.1 Thermodynamics ; 931.2 Physical Properties of Gases, Liquids and Solids
来源库	WOS
引用统计	被引频次[WOS]：0 [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	https://ir.lut.edu.cn/handle/2XXMBERH/158067
专题	材料科学与工程学院
通讯作者	Lin, Qiaoli
作者单位	Lanzhou Univ Technol, State Key Lab Adv Proc & Recycling Nonferrous Met, Lanzhou 730050, Peoples R China
第一作者单位	省部共建有色金属先进加工与再利用国家重点实验室
通讯作者单位	省部共建有色金属先进加工与再利用国家重点实验室
第一作者的第一单位	省部共建有色金属先进加工与再利用国家重点实验室
推荐引用方式 GB/T 7714	Lin, Qiaoli,Liu, Lu,Zhu, Wenqi. Formation Mechanism of Precursor Films at High Temperatures: A Review[J]. Chinese Journal of Mechanical Engineering (English Edition),2022,35(1).
APA	Lin, Qiaoli,Liu, Lu,&Zhu, Wenqi.(2022).Formation Mechanism of Precursor Films at High Temperatures: A Review.Chinese Journal of Mechanical Engineering (English Edition),35(1).
MLA	Lin, Qiaoli,et al."Formation Mechanism of Precursor Films at High Temperatures: A Review".Chinese Journal of Mechanical Engineering (English Edition) 35.1(2022).