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Modification of a-C:H films via nitrogen and silicon doping: The way to the superlubricity in moisture atmosphere
Wang, Kai1,2; Yang, Baoping1; Zhang, Bin2; Bai, Changning2,3; Mou, Zhixing1,2; Gao, Kaixiong2; Yushkov, Georgy4; Oks, Efim5
2020-08-01
发表期刊Diamond and Related Materials
ISSN09259635
卷号107
摘要Both nitrogen and silicon-doped carbon (a-CNx:H and a-CSi:H) films show superlubrcity properties in distinguished sliding conditions, but most running machines are required to serve in humidity air atmosphere. Therefore, we aim to explore N and Si doping effects on tribology of a-C:H films and reveal the basic factors of superlubricity in open atmosphere with a humidity of 41%. In present work, three kinds of films (a-C:H, a-CNx:H and the a-CSi:H films) were prepared on n-Si(100) substrates by plasma-enhanced chemical vapor deposition (PECVD). The thickness, element distribution, bonding topolograph and nanostructure of all films before and after friction test, including wear debris, tracks and debris, were detected by means of XPS, Raman, HRTEM and SEM, etc. Compared with hydrogenated carbon film (a-C:H), the highest COF (0.089) and wear rate (3.61 × 10−7 mm3/Nm) of a-CNx:H film are attributed to forming Fe3C, Fe2O3 and Cr2O3 on the slide surface due to the chemical reaction with moisture atmosphere, which caused by the emission of N element via the broken C[dbnd]N structure that induced more activity dangling bonds. However, the silicon-doped carbon film (a-CSi:H) exhibited extremely low COF (0.007) and extremely low wear rate (4.76 × 10−8 mm3/Nm), which can be ascribed to the Si which is more reactive with moisture atmosphere, prohibiting the oxidization of carbon matrix and helping to forming more curved graphene structures to low the friction force. © 2020 Elsevier B.V.
关键词Carbon films Chemical bonds Chromium compounds Dangling bonds Debris Friction Hematite Moisture Nitrogen Plasma CVD Plasma enhanced chemical vapor deposition Semiconductor doping Silicon compounds Wear of materials Element distribution Friction force Hydrogenated carbon films Open atmosphere Plasma enhanced chemical vapor depositions (PE CVD) Si (100) substrate Silicon doping Sliding conditions
DOI10.1016/j.diamond.2020.107873
收录类别EI
语种英语
出版者Elsevier Ltd
EI入藏号20201808608680
EI主题词Silicon
来源库Compendex
分类代码482.2 Minerals - 549.3 Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals - 712.1 Semiconducting Materials - 801.4 Physical Chemistry - 802.2 Chemical Reactions - 804 Chemical Products Generally - 813.1 Coating Techniques - 813.2 Coating Materials - 951 Materials Science
引用统计
被引频次:25[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符https://ir.lut.edu.cn/handle/2XXMBERH/115763
专题图书馆
石油化工学院
作者单位1.College of Petrochemical Technology, Lanzhou University of Technology, Lanzhou; 730050, China;
2.State Key Laboratory of Solid Lubrication, R&D Center of Lubricating and Protecting Materials, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou; 730000, China;
3.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing; 100049, China;
4.High Current Electronics Institute, Russian Academy of Sciences, Tomsk; 634055, Russia;
5.Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Avenue, Tomsk; 634050, Russia
第一作者单位兰州理工大学
第一作者的第一单位兰州理工大学
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GB/T 7714
Wang, Kai,Yang, Baoping,Zhang, Bin,et al. Modification of a-C:H films via nitrogen and silicon doping: The way to the superlubricity in moisture atmosphere[J]. Diamond and Related Materials,2020,107.
APA Wang, Kai.,Yang, Baoping.,Zhang, Bin.,Bai, Changning.,Mou, Zhixing.,...&Oks, Efim.(2020).Modification of a-C:H films via nitrogen and silicon doping: The way to the superlubricity in moisture atmosphere.Diamond and Related Materials,107.
MLA Wang, Kai,et al."Modification of a-C:H films via nitrogen and silicon doping: The way to the superlubricity in moisture atmosphere".Diamond and Related Materials 107(2020).
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