Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering

doi:10.1016/j.surfcoat.2013.12.067

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	Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering
	Jiang, Jinlong1,2 ; Wang, Qiong 1; Huang, Hao 1; Wang, Yubao 1; Zhang, Xia 1; Hao, Junying 2
	2014-02-15
发表期刊	Surface and Coatings Technology
ISSN	02578972
卷号	240 页码:419-424
摘要	Ti and Si dual-doped hydrogenated amorphous carbon (a-C:H) films were synthesized by mid-frequency (MF) magnetron sputtering with stationary and rotary substrates. The effects of substrate rotation on the microstructure, surface morphology, internal stress and mechanical properties were investigated. The results show that substrate rotation plays an important role in the growth of the a-C:H films. The film deposited on rotary substrate has a higher sp2 content with high degree of bond disorder and relatively low H content, thus resulting in much lower compressive stress and high hardness. The structural changes induced by the substrate rotation are discussed in terms of subplantation and migration roles of incident species in growth of the films. Moreover, the film deposited on rotary substrate shows smoother surface with small and dense particles, which is attributed to suppressing the shadowing effect by rotating substrate. © 2013 Elsevier B.V.
关键词	Amorphous carbon Amorphous silicon Carbon films Magnetron sputtering Microstructure Rotation Substrates Surface morphology a-C:H films Hydrogenated amorphous carbon (a-C:H) MF magnetron sputtering Microstructure and properties Rotary substrates Rotating substrates Shadowing effects Substrate rotation
DOI	10.1016/j.surfcoat.2013.12.067
收录类别	EI ; SCIE
语种	英语
资助项目	Excellent Young Teachers Program of Lanzhou University of Technology[1010ZCX010]
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Coatings & Films ; Physics, Applied
WOS记录号	WOS:000331989900057
出版者	Elsevier B.V.
EI入藏号	20140617281917
EI主题词	Morphology
EI分类号	549.3 Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals - 813.2 Coating Materials - 931.1 Mechanics - 933.2 Amorphous Solids - 951 Materials Science
来源库	Compendex
分类代码	549.3 Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals - 813.2 Coating Materials - 931.1 Mechanics - 933.2 Amorphous Solids - 951 Materials Science
引用统计	被引频次：8[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	https://ir.lut.edu.cn/handle/2XXMBERH/113605
专题	理学院
通讯作者	Jiang, Jinlong
作者单位	1.Lanzhou Univ Technol, Dept Phys, Lanzhou 730050, Peoples R China; 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
第一作者单位	理学院
通讯作者单位	理学院
第一作者的第一单位	理学院
推荐引用方式 GB/T 7714	Jiang, Jinlong,Wang, Qiong,Huang, Hao,et al. Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering[J]. Surface and Coatings Technology,2014,240:419-424.
APA	Jiang, Jinlong,Wang, Qiong,Huang, Hao,Wang, Yubao,Zhang, Xia,&Hao, Junying.(2014).Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering.Surface and Coatings Technology,240,419-424.
MLA	Jiang, Jinlong,et al."Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering".Surface and Coatings Technology 240(2014):419-424.