Iodide-induced galvanic replacement of nickel film on copper as activator for electroless nickel-phosphorus plating

doi:10.1016/j.matlet.2022.131833

IR > 石油化工学院

	Iodide-induced galvanic replacement of nickel film on copper as activator for electroless nickel-phosphorus plating
	Zhao, Qiuping1 ; Hu, Guanqun 1,2; Huang, Rui 3; Qiang, Li 2; Zhang, Xingkai 2
	2022-05-01
发表期刊	Materials Letters
ISSN	0167-577X
卷号	314
摘要	Galvanic replacement provides a convenient route to synthesize metallic films and nanostructures. However, metals commonly reduce more noble metal ions. In this work, nickel film was deposited on copper through an iodide-assisted galvanic replacement method. It was found copper had a lower electrode potential than nickel in high concentration of iodide solution, so nickel film could be obtained through the unusual galvanic replacement. The experimental results revealed increasing iodide concentration was conducive to the galvanic replacement rate between copper and nickel ions, and complete nickel film could be obtained in solution with 1200 g·L−1 sodium iodide in 10 min. The as-prepared nickel film showed good activation ability for electroless nickel-phosphorus plating, for the nickel-phosphorus coatings obtained on the nickel and traditional palladium films possessed similar morphology, structure and corrosion resistance. © 2022 Elsevier B.V.
关键词	Copper compounds Copper corrosion Corrosion resistance Corrosion resistant coatings Deposition Metal ions Metallic films Morphology Precious metals Copper ions Electrode potentials Electroless nickel-phosphorus plating Galvanic replacements Iodide Iodide solution Nickel film Replacement methods Replacement rates Thin-films
DOI	10.1016/j.matlet.2022.131833
收录类别	EI ; SCIE
语种	英语
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号	WOS:000766079800004
出版者	Elsevier B.V.
EI入藏号	20220611596584
EI主题词	Thin films
EI分类号	531.1 Metallurgy ; 539.1 Metals Corrosion ; 539.2 Corrosion Protection ; 544.1 Copper ; 547.1 Precious Metals ; 802.3 Chemical Operations ; 931.2 Physical Properties of Gases, Liquids and Solids ; 951 Materials Science
来源库	WOS
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	https://ir.lut.edu.cn/handle/2XXMBERH/157879
专题	石油化工学院
通讯作者	Zhang, Xingkai
作者单位	1.Lanzhou Univ Technol, Coll Petrochem Technol, Lanzhou 730050, Peoples R China; 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China; 3.Northwest Normal Univ, Coll Phys & Elect Engn, Lanzhou 730070, Peoples R China
第一作者单位	石油化工学院
第一作者的第一单位	石油化工学院
推荐引用方式 GB/T 7714	Zhao, Qiuping,Hu, Guanqun,Huang, Rui,et al. Iodide-induced galvanic replacement of nickel film on copper as activator for electroless nickel-phosphorus plating[J]. Materials Letters,2022,314.
APA	Zhao, Qiuping,Hu, Guanqun,Huang, Rui,Qiang, Li,&Zhang, Xingkai.(2022).Iodide-induced galvanic replacement of nickel film on copper as activator for electroless nickel-phosphorus plating.Materials Letters,314.
MLA	Zhao, Qiuping,et al."Iodide-induced galvanic replacement of nickel film on copper as activator for electroless nickel-phosphorus plating".Materials Letters 314(2022).