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Electron field emission of iron and cobalt-doped DLC films fabricated by electrochemical deposition
Ling, Xiaoming1; Zhang, Peizeng2; Li, Ruishan3; Fan, Duowang1; Yao, Xiaoming1
2013-05
发表期刊SURFACE AND INTERFACE ANALYSIS
ISSN0142-2421
卷号45期号:5页码:943-948
摘要Using a simple electrochemical depositing process, iron and cobalt-doped diamond-like carbon (DLC) films were deposited on Si (100) substrates. The results showed that metallic elements were inhomogeneously doped into highly cross-linking amorphous carbon matrix, forming the typical nanocrystalline/amorphous nanocomposite structure, and simultaneously the microsturcture of amorphous carbon was changed by the doping of metals. Field emission performance showed that the incorporation of iron and cobalt effectively decreases the threshold field from 13.5V/mu m to 8.0V/mu m and 6.5V/mu m, respectively, and a highest current density of the Co-DLC film was about 1.2mA/cm(2) at the electric field of 23.5V/mu m. Copyright (C) 2012 John Wiley & Sons, Ltd.
关键词electrochemical deposition diamond-like carbon field emission performance nanocrystalline/amorphous structure
DOI10.1002/sia.5186
收录类别SCI ; SCIE
语种英语
资助项目National Natural Science Foundation of China[51005110]
WOS研究方向Chemistry
WOS类目Chemistry, Physical
WOS记录号WOS:000319051700010
出版者WILEY-BLACKWELL
EI入藏号20131716229081
EI主题词Electrochemical deposition
EI分类号531 Metallurgy and Metallography - 545.1 Iron - 549.3 Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals - 701.1 Electricity: Basic Concepts and Phenomena - 712.1 Semiconducting Materials - 761 Nanotechnology - 802.2 Chemical Reactions - 804.2 Inorganic Compounds - 813.2 Coating Materials - 933.2 Amorphous Solids
引用统计
被引频次:10[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符https://ir.lut.edu.cn/handle/2XXMBERH/34709
专题理学院
通讯作者Fan, Duowang
作者单位1.Lanzhou Jiaotong Univ, Minist Educ, Key Lab Optoelect Technol & Intelligent Control, Lanzhou 730070, Peoples R China;
2.Lanzhou Univ, Minist Educ, Key Lab Magnetism & Magnet Mat, Lanzhou 730000, Peoples R China;
3.Lanzhou Univ Sci & Technol, Sch Sci, Lanzhou 730050, Peoples R China
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Ling, Xiaoming,Zhang, Peizeng,Li, Ruishan,et al. Electron field emission of iron and cobalt-doped DLC films fabricated by electrochemical deposition[J]. SURFACE AND INTERFACE ANALYSIS,2013,45(5):943-948.
APA Ling, Xiaoming,Zhang, Peizeng,Li, Ruishan,Fan, Duowang,&Yao, Xiaoming.(2013).Electron field emission of iron and cobalt-doped DLC films fabricated by electrochemical deposition.SURFACE AND INTERFACE ANALYSIS,45(5),943-948.
MLA Ling, Xiaoming,et al."Electron field emission of iron and cobalt-doped DLC films fabricated by electrochemical deposition".SURFACE AND INTERFACE ANALYSIS 45.5(2013):943-948.
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