Lanzhou University of Technology Institutional Repository (LUT_IR)
Photocatalytic, Fenton and photo-Fenton degradation of RhB over Z-scheme g-C3N4/LaFeO3 heterojunction photocatalysts | |
Ye, Yongchun1,2; Yang, Hua1,2; Wang, Xiangxian2; Feng, Wangjun2 | |
2018-08 | |
发表期刊 | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING |
ISSN | 1369-8001 |
卷号 | 82页码:14-24 |
摘要 | Z-scheme g-C3N4/LaFeO3 heterojunction photocatalysts were prepared by calcining the uniformly mixed g-C3N4 nanosheets and LaFeO3 nanoparticles at 300 degrees C for 1 h. The as-prepared g-C3N4/LaFeO3 composites were systematically characterized by XRD, SEM, TEM, XPS, UV-vis DRS, PL spectroscopy, EIS and photocurrent response. It is demonstrated that LaFeO3 nanoparticles (average size: ca. 35 nm) are uniformly assembled onto the surface of g-C3N4 nanosheets through chemical bonding, leading to the formation of g-C3N4/LaFeO3 heterojunctions. The photocatalytic, Fenton and photo-Fenton performances of the samples were investigated by degrading RhB using simulated sunlight as the light source. Compared to bare LaFeO3 and g-C3N4, the g-C3N4/LaFeO3 composites exhibit significantly enhanced photocatalytic and photo-Fenton degradation of the dye, and the maximum activity is observed for the 15% g-C3N4/LaFeO3 composite. Moreover, the photo-Fenton performance of the composites is much higher than the photocatalytic or Fenton performances. The much improved photo-fenton activity is ascribed to the efficient separation of photogenerated electron-hole pairs due to the Z-scheme electron transfer and the synergistic effect between LaFeO3 and g-C3N4. center dot OH radicals were examined by PL spectroscopy using TPA as a probe molecule, clearly revealing the center dot OH generation, and moreover, the center dot OH yield and the dye degradation rate show a similar variation between different cases of the catalysis process. This suggested that center dot OH is the dominant reactive species causing the dye degradation. The underlying photo-Fenton mechanism of the composites is discussed. |
关键词 | LaFeO3 nanoparticles g-C3N4 nanosheets g-C3N4/LaFeO3 heterojunction Catalytic activity Photo-Fenton mechanism |
DOI | 10.1016/j.mssp.2018.03.033 |
收录类别 | SCI ; SCIE |
语种 | 英语 |
资助项目 | National Natural Science Foundation of China[51662027] |
WOS研究方向 | Engineering ; Materials Science ; Physics |
WOS类目 | Engineering, Electrical & Electronic ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter |
WOS记录号 | WOS:000429746600003 |
出版者 | ELSEVIER SCI LTD |
EI入藏号 | 20181404973469 |
EI主题词 | Lanthanum compounds |
EI分类号 | 714.2 Semiconductor Devices and Integrated Circuits - 761 Nanotechnology - 801.4 Physical Chemistry - 802.2 Chemical Reactions - 803 Chemical Agents and Basic Industrial Chemicals - 804 Chemical Products Generally - 933 Solid State Physics |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | https://ir.lut.edu.cn/handle/2XXMBERH/32521 |
专题 | 省部共建有色金属先进加工与再利用国家重点实验室 理学院 |
通讯作者 | Yang, Hua |
作者单位 | 1.Lanzhou Univ Technol, State Key Lab Adv Proc & Recycling Nonferrous Met, Lanzhou 730050, Gansu, Peoples R China; 2.Lanzhou Univ Technol, Sch Sci, Lanzhou 730050, Gansu, Peoples R China |
第一作者单位 | 省部共建有色金属先进加工与再利用国家重点实验室; 理学院 |
通讯作者单位 | 省部共建有色金属先进加工与再利用国家重点实验室; 理学院 |
第一作者的第一单位 | 省部共建有色金属先进加工与再利用国家重点实验室 |
推荐引用方式 GB/T 7714 | Ye, Yongchun,Yang, Hua,Wang, Xiangxian,et al. Photocatalytic, Fenton and photo-Fenton degradation of RhB over Z-scheme g-C3N4/LaFeO3 heterojunction photocatalysts[J]. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,2018,82:14-24. |
APA | Ye, Yongchun,Yang, Hua,Wang, Xiangxian,&Feng, Wangjun.(2018).Photocatalytic, Fenton and photo-Fenton degradation of RhB over Z-scheme g-C3N4/LaFeO3 heterojunction photocatalysts.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,82,14-24. |
MLA | Ye, Yongchun,et al."Photocatalytic, Fenton and photo-Fenton degradation of RhB over Z-scheme g-C3N4/LaFeO3 heterojunction photocatalysts".MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING 82(2018):14-24. |
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