Gas Expansion Process in the Dynamic Vacuum Calibration
Cheng, Yongjun1; Chen, Shuping2; Wang, Chenghong2; Xi, Zhenhua1; Sun, Wenjun1; Liu, Dan2
2021-04-01
发表期刊Journal of Shanghai Jiaotong University (Science)
ISSN1007-1172
卷号26期号:2页码:193-200
摘要By analyzing the gas expansion process from the upstream chamber via an orifice and a very rapid-opening ultra-high vacuum (UHV) gate valve to downstream one, the standard pressure analytical model based on the dynamic vacuum calibration apparatus in millisecond range developed by Lanzhou Institute of Physics (LIP) is deduced theoretically and corrected by real gas characteristics and temperature changes. According to the Knudsen criterion, there is no free molecular flow regime in the area in front of the orifice during the gas expansion, so the chocked flow approximation is adopted to reduce the difficulty of numerical computation. Under this approximation and the full opening of the rapid valve, the standard pressure expression is calculated theoretically, and the upstream chamber pressure and temperature changes are obtained by numerical simulation during the gas expansion from 100 kPa to 10 kPa. Also, experiments are performed using capacitance diaphragm gauges (model CDG045Dhs). The uncertainties between the measured pressure and the simulated and theoretical ones are 10% and 4.65%, respectively, which indicates that the apparatus can generate predictable pressure changes in the millisecond range and the conceptual model can better approximate the calibration results. Finally, the orifice conductance, and the correction factors of real gas characteristics and temperature change to the standard pressure are calculated according to the simulation results; the corrected standard pressure expression is obtained. © 2021, Shanghai Jiao Tong University and Springer-Verlag GmbH Germany, part of Springer Nature.
关键词Calibration Expansion Orifices Ultrahigh vacuum Capacitance diaphragm gauges Conceptual model Correction factors Free molecular flow Institute of Physics Millisecond range Numerical computations Temperature changes
DOI10.1007/s12204-021-2279-3
收录类别EI
语种英语
出版者Shanghai Jiaotong University
EI入藏号20211410164168
EI主题词Gases
EI分类号633 Vacuum Technology ; 951 Materials Science
引用统计
文献类型期刊论文
条目标识符https://ir.lut.edu.cn/handle/2XXMBERH/148440
专题石油化工学院
附属中学
作者单位1.Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou; 730000, China;
2.School of Petrochemical Engineering, Lanzhou University of Technology, Lanzhou; 730050, China
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GB/T 7714
Cheng, Yongjun,Chen, Shuping,Wang, Chenghong,et al. Gas Expansion Process in the Dynamic Vacuum Calibration[J]. Journal of Shanghai Jiaotong University (Science),2021,26(2):193-200.
APA Cheng, Yongjun,Chen, Shuping,Wang, Chenghong,Xi, Zhenhua,Sun, Wenjun,&Liu, Dan.(2021).Gas Expansion Process in the Dynamic Vacuum Calibration.Journal of Shanghai Jiaotong University (Science),26(2),193-200.
MLA Cheng, Yongjun,et al."Gas Expansion Process in the Dynamic Vacuum Calibration".Journal of Shanghai Jiaotong University (Science) 26.2(2021):193-200.
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