The Performance Investigation of Junctionless Transistor by Considering Different Recessed Gates
Lou, Haijun1,2; Li, Wentao2; Yang, Yumei1; Lin, Xinnan2
2018-10-09
会议名称2018 IEEE International Conference on Electron Devices and Solid State Circuits, EDSSC 2018
会议录名称2018 IEEE International Conference on Electron Devices and Solid State Circuits, EDSSC 2018
会议日期June 6, 2018 - June 8, 2018
会议地点Shenzhen, China
出版者Institute of Electrical and Electronics Engineers Inc.
摘要In this paper, the performance of junctionless transistor with three different recessed gates is investigated by numerical simulation. Then the impact of sidewall and the overlapped gate is discussed. The results show that the different recessed gates change the threshold voltage of devices. As compared between the three proposed devices, the gate-over structure has more superior subthreshold characterictics and drain current peformance. The sidewall angle variation in the gate-over devices is also studied. It will offer a helpful guide for fabricating the junctionless transistor with recessed gates. © 2018 IEEE.
关键词Drain current Threshold voltage junctionless Junctionless transistors Recessed gate sidewall Sidewall angles Subthreshold
DOI10.1109/EDSSC.2018.8487085
收录类别EI
语种英语
EI入藏号20184606070754
EI主题词Solid state devices
来源库Compendex
分类代码701.1 Electricity: Basic Concepts and Phenomena - 714.2 Semiconductor Devices and Integrated Circuits
引用统计
文献类型会议论文
条目标识符https://ir.lut.edu.cn/handle/2XXMBERH/118093
专题机电工程学院
理学院
作者单位1.School of Science, Lanzhou University of Technology, Lanzhou; 730050, China;
2.Shenzhen Key Lab of Advanced Electron Device and Integration, School of Electronic and Computer Engineering, Peking University Shenzhen Graduate School, Shenzhen; 518055, China
第一作者单位兰州理工大学;  研究生院
推荐引用方式
GB/T 7714
Lou, Haijun,Li, Wentao,Yang, Yumei,et al. The Performance Investigation of Junctionless Transistor by Considering Different Recessed Gates[C]:Institute of Electrical and Electronics Engineers Inc.,2018.
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