Atomic mapping of structural distortions in 109° domain patterned BiFeO3 thin films

doi:10.1557/jmr.2017.206

	Atomic mapping of structural distortions in 109° domain patterned BiFeO3 thin films
	Wang, Wen-Yuan 1,2; Zhu, Yin-Lian 1; Tang, Yun-Long 1; Han, Meng-Jiao 1; Wang, Yu-Jia 1; Ma, Xiu-Liang1,3
	2017-06-28
发表期刊	Journal of Materials Research
ISSN	08842914
卷号	32 期号:12 页码:2423-2430
摘要	Structural distortions at the nanoscale are delicately linked with many exotic properties for ferroic thin films. Based on advanced aberration corrected scanning transmission electron microscopy, we observe BiFeO3 thin films with variant tensile strain states and demonstrate at an atomic scale the interplay of intrinsic spontaneous structural distortions with external constraints. Structural parameters (the rhombohedral distortion and domain wall shear distortion) under zero (BiFeO3/GdScO3) and 1.5% (BiFeO3/PrScO3) lateral strain states are quantitatively analyzed which are suppressed within a few unit cells near the film/substrate interfaces. In particular, an interfacial layer with asymmetrical lattice distortions (enhanced and reduced out-of-plane lattice spacing) on the two sides of 109° domain wall is resolved. These structural distortions near the film/substrate interface in ferroic thin films reveal intense tanglement of intrinsic distortions of BiFeO3 with external boundary conditions, which could provide new insights for the development of nanoscale ferroelectric devices. © Materials Research Society 2017.
关键词	Bismuth compounds Domain walls Ferroelectric films Ferroelectric materials Ferroelectricity Films High resolution transmission electron microscopy Interface states Iron compounds Nanotechnology Scanning electron microscopy Tensile strain Transmission electron microscopy Aberration-corrected scanning transmission electron microscopies External boundary conditions External constraints Film/substrate interface Out-of-plane lattices Rhombohedral distortion Structural distortions Structural parameter
DOI	10.1557/jmr.2017.206
收录类别	EI ; SCIE
语种	英语
WOS研究方向	Materials Science
WOS类目	Materials Science, Multidisciplinary
WOS记录号	WOS:000404965300023
出版者	Cambridge University Press
EI入藏号	20172403769608
EI主题词	Thin films
EI分类号	602.2 Mechanical Transmissions - 701.1 Electricity: Basic Concepts and Phenomena - 708.1 Dielectric Materials - 741.3 Optical Devices and Systems - 761 Nanotechnology - 931 Classical Physics ; Quantum Theory ; Relativity - 931.1 Mechanics - 932 High Energy Physics ; Nuclear Physics ; Plasma Physics
来源库	Compendex
分类代码	701.1 Electricity: Basic Concepts and Phenomena - 708.1 Dielectric Materials - 741.3 Optical Devices and Systems - 761 Nanotechnology - 931 Classical Physics; Quantum Theory; Relativity - 931.1 Mechanics - 932 High Energy Physics; Nuclear Physics; Plasma Physics
引用统计	被引频次：7[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	https://ir.lut.edu.cn/handle/2XXMBERH/114770
专题	材料科学与工程学院材料科学与工程学院_特聘教授组
通讯作者	Ma, Xiu-Liang
作者单位	1.Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Peoples R China; 2.Sci & Technol Surface Phys & Chem Lab, Jiangyou 621908, Sichuan, Peoples R China; 3.Lanzhou Univ Technol, Sch Mat Sci & Engn, Lanzhou 730050, Peoples R China
通讯作者单位	材料科学与工程学院
推荐引用方式 GB/T 7714	Wang, Wen-Yuan,Zhu, Yin-Lian,Tang, Yun-Long,et al. Atomic mapping of structural distortions in 109° domain patterned BiFeO3 thin films[J]. Journal of Materials Research,2017,32(12):2423-2430.
APA	Wang, Wen-Yuan,Zhu, Yin-Lian,Tang, Yun-Long,Han, Meng-Jiao,Wang, Yu-Jia,&Ma, Xiu-Liang.(2017).Atomic mapping of structural distortions in 109° domain patterned BiFeO3 thin films.Journal of Materials Research,32(12),2423-2430.
MLA	Wang, Wen-Yuan,et al."Atomic mapping of structural distortions in 109° domain patterned BiFeO3 thin films".Journal of Materials Research 32.12(2017):2423-2430.